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Photomask Repair
Nanomachining has recently been introduced
as a new option for the repair of photomasks. The nm650 system
is a high precision system for subtractive removal of opaque
mask defects.
Defects on binary chrome
on glass masks, alternating phase shift masks and both
248nm and 193nm halftone phase shift masks, carbon patch
trimming, sequential defect removal as well as repair
of "non-removable" particles and irregularly shaped
quartz bump defects represent the unique capabilities of our
tool.
The control of pattern
defects is the most critical issue for the production of
high-end photomasks with decreasing feature size and increasing
mask complexity. In the past, there were two options for photomask
repair: Focused Ion Beam (FIB) or laser. While each technique
has its advantages and unique capabilities, each has
its limitations, also.
In addition to these well-established
options, a third method, nanomachining, has recently been
introduced. This technique is a high precision method for
subtractive removal of opaque mask defects utilizing the advantages
of an atomic force microscope (AFM) for excellent edge placement
and z-depth control. The technique is implemented in the RAVE
nm650 nanomachining mask repair tool.
- Excellent repair capability is
essential for the production of high-end photomasks
- In the past only two options:
- Laser tools
- Focused Ion Beam tools
- Each of these techniques has its
advantages and fields of use
- But there are also limitations
(e. g. quartz bump defects)
- Now, a third method is
commercially available:
- Method: Nanomachining
- Tool: RAVE nm650
To Read More about Nanomachining
Technology
Click on the following links:
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to view any of the Printable Document Format files (PDF files).
You can click
here, or on the Adobe link to download the software. |
