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:: Photomask Repair


Nanomachining has recently been introduced as a new option for the repair of photomasks. The nm650 system is a high precision system for subtractive removal of opaque mask defects.

Nanomachining Technology

Defects on binary chrome on glass masks, alternating phase shift masks and both 248nm and 193nm halftone phase shift masks, carbon patch trimming, sequential defect removal as well as repair of "non-removable" particles and irregularly shaped quartz bump defects represent the unique capabilities of our tool.

The control of pattern defects is the most critical issue for the production of high-end photomasks with decreasing feature size and increasing mask complexity. In the past, there were two options for photomask repair: Focused Ion Beam (FIB) or laser. While each technique has its advantages and unique capabilities, each has its limitations, also.

In addition to these well-established options, a third method, nanomachining, has recently been introduced. This technique is a high precision method for subtractive removal of opaque mask defects utilizing the advantages of an atomic force microscope (AFM) for excellent edge placement and z-depth control. The technique is implemented in the RAVE nm650 nanomachining mask repair tool.

  • Excellent repair capability is essential for the production of high-end photomasks
  • In the past only two options:
    - Laser tools
    - Focused Ion Beam tools
  • Each of these techniques has its advantages and fields of use
  • But there are also limitations (e. g. quartz bump defects)
  • Now, a third method is commercially available:
    - Method: Nanomachining
    - Tool: RAVE nm650

To Read More about Nanomachining Technology
Click on the following links:

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E-mail: sales@ravenano.com Rave Nanomachining