Advanced Photomask Repair Tool-RAVE

• History of RAVE
• Board of Directors
• Our Facility
• Our Location
• Contact Us
• Careers

• Rhazer™
• nm450
• fp650
• Photomask Repair
• Technology
• Applications

:: Our Products

RAVE is proud to introduce the new Rhazer™ Haze Removal System. Global semiconductor wafer fabs are struggling with an increasingly serious and costly reticle contamination problem known as “Haze.” The haze problem grows worse with each successive technology node shrink and is having a significant impact on wafer manufacturing costs. The new Rhazer™ system quickly removes haze related defects from reticles without pellicle removal and causes no damage to the reticle absorber materials. The Rhazer™ system is specifically designed to operate inside the wafer fab and provide a fast-turn haze management capability. For more system details and process results see our Rhazer™ web page.

The nm450 Nanomachining System is the world’s most advanced Photomask repair tool. This revolutionary new system provides mask makers with the capability to remove defects on all known Photomask materials including Binary Chrome, Molybdenum Silicide, Quartz and EUV materials. The system is also capable of trimming carbon patches and removing unknown foreign contamination. The nm450 is a fourth generation tool with the extreme precision and reliability to make it the system of choice for production level 45nm Technology Node mask repairs and more than suitable for 32nm Technology Node mask development. For more system details and process results see our nm450 web page.

The fp650 Femto-Pulse Laser System is the newest addition to RAVE’s highly successful family of Photomask repair tools. With its extraordinary high-speed and precision mask repair capability, the fp650 is today’s most cost effective solution to replace obsolete, older, slower and less capable existing laser and FIB mask repair systems. The fp650 is designed for volume production mask repairs down to the 65nm Technology Node including large and small area image reconstruction and through pellicle repairs. For more system details and process results see our fp650 web page.

Future RAVE products will extend nanomachining into other advanced microelectronic and nano-scale sciences where atomic level machining and material shaping is needed to enable a host of emerging nano-technologies.