RAVE
is proud to introduce the new Rhazer™ Haze
Removal System. Global semiconductor
wafer fabs are struggling with an increasingly
serious and costly reticle contamination
problem known as “Haze.” The
haze problem grows worse with each successive
technology node shrink and is having
a significant impact on wafer manufacturing
costs. The new Rhazer™ system
quickly removes haze related defects
from reticles without pellicle removal
and causes no damage to the reticle absorber
materials. The Rhazer™ system
is specifically designed to operate inside
the wafer fab and provide a fast-turn
haze management capability. For more
system details and process results see
our Rhazer™ web
page.