History of RAVE

RAVE LLC’s earliest concept mask repair system, and the atomic force microscope guided nanomachining upon which it is based, were invented and largely developed and brought to the stage of initial marketability by Victor B. Kley and General Nanotechnology, LLC during the period from 1992 to 1995.  General Nanotechnology continued to participate in the development and improvement of the product until 2004.  Additional information regarding General Nanotechnology’s contributions to RAVE may be found on General Nanotechnology’s website, www.gennano.com.  RAVE is not responsible for the content of General Nanotechnology’s website.