:: News & Events

See Us At:

• SEMICON West 2010 – July 13-15, 2010 at the Moscone Center, San Francisco, California, USA (Call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at the show)

• SPIE Photomask Technology 2010 (BACUS) – September 13-16, 2010 at the Monterey Marriott, Monterey, California, USA (Visit our booth at the supplier exhibition)

• SEMICON Japan 2010 – December 1-3, 2010 at the Makuhari Messe, Chiba, Japan (Visit our booth at the supplier exhibition)

• SPIE Advanced Lithography 2011 – February 27-March 4, 2011 at the San Jose McEnery Convention Center, San Jose, California, USA (Visit our booth at the supplier exhibition)

• Photomask Japan 2011 – April 13-15, 2011 at the Pacifico Yokohama, Yokohama, Japan (Visit our booth at the supplier exhibition)

Press Releases:

Chartered Semiconductor Buys New Rhazer™ Haze Removal System
New wafer fab clean tool brings significant time and cost savings to mask haze problem.

Delray Beach, Florida, May 28, 2009 – Today, RAVE LLC announced receipt of a purchase order for its new Rhazer™ haze removal system from one of the world’s leading dedicated semiconductor foundries, Chartered Semiconductor Manufacturing Limited, Singapore.

RAVE unveiled the Rhazer™ system in 2008 with a breakthrough dry process for the non-invasive removal of haze contamination from advanced photomasks.

Chartered has been evaluating the potential of the Rhazer technology since early 2009. The company elected to collaborate with RAVE as production beta partner to implement the Rhazer haze management system and process at Chartered’s Fab7 wafer production line in Singapore.

RAVE CEO, Barry Hopkins, stated “We are very pleased to be working with the Chartered engineering team. The foundry wafer fabrication environment is particularly well suited for the Rhazer technology. The RAVE team has developedHopkh an excellent working relationship and professional respect for the Chartered team and organization. We are looking forward to a highly favorable opportunity for both companies.”

Chartered Fab7 Reticle Management Team, who has been aggressively evaluating the system over the past few months said, “Our investigation concluded RAVE’s Rhazer™ haze removal system works “as advertised” and we expect this new haze mitigation technology to bring significant time and cost savings to our photomask clean and control program.”

Detailed information about RAVE LLC and the exciting new Rhazer™ product can be viewed on the RAVE LLC webpage: www.ravenano.com

About RAVE LLC
RAVE LLC is a global supplier of advanced process solutions to the Semiconductor Industry. Since 2001, RAVE has been recognized as a leading-edge manufacturing equipment supplier. With the Rhazer™ haze removal system, RAVE is again introducing process technology that is expected to bring enormous cost savings to wafer fabs around the world. RAVE LLC is headquartered in Delray Beach, Florida, USA and maintains sales and service offices in Asia, Europe and the USA. All product and service names are trademarks or registered trademarks.

About Chartered
Chartered Semiconductor Manufacturing Ltd. (Nasdaq: CHRT, SGX-ST: CHARTERED), one of the world's top dedicated semiconductor foundries, offers leading-edge technologies down to 40/45 nanometer (nm), enabling today's system-on-chip designs. The company further serves its customers' needs through a collaborative, joint development approach on a technology roadmap that extends to 22nm. Chartered's strategy is based on open and comprehensive design enablement solutions, manufacturing enhancement strategies, and a commitment to flexible sourcing. In Singapore, the company owns or has an interest in six fabrication facilities, including a 300mm fabrication facility and five 200mm fabrication facilities. Information about Chartered can be found at www.charteredsemi.com

This press release contains forward-looking statements. The Companies undertake no obligation to update the forward-looking statements contained herein to reflect events or circumstances after the date hereof or to reflect the occurrence of unanticipated events.

RAVE LLC introduces the Rhazer™ Haze Removal System
New wafer fab tool provides enormous cost saving haze management capability.

Delray Beach, Florida, July 15, 2008 – Today, RAVE LLC introduced its revolutionary Rhazer™ Haze Removal System.

Global semiconductor wafer fabs are struggling with an increasingly serious and costly lithography problem. Wafer stepper exposures initiate the growth of crystalline defect contamination on reticles commonly known as “Haze.” The haze formation rate reduces the number of wafer exposures and forces lithography line stoppage. Reticles with haze must be returned to the mask shop for pellicle removal and wet clean. However, excessive wet cleans damage the reticle absorber materials and deposit additional chemical residues causing the haze to re-form at an increased rate. Recent wet clean and environmental control techniques have helped to slow haze formation, but show no promise of a haze prevention solution. The haze problem has worsened with each technology node shrink and is having a significant impact on wafer manufacturing costs.

“The Rhazer™ system does not prevent haze, but allows the wafer fab to manage it!” commented RAVE President and CEO, Barry Hopkins, “The Rhazer™ system is designed to reside in the wafer fab and provide a resident capability to completely remove haze from both sides of reticles in less than one working shift. The process is dry and does not require removal of the pellicle. Haze is expected to reform, but the Rhazer™ cleaning process causes no damage to the mask absorber materials, meaning reticles can be cleaned as often as needed without leaving the control of the fab line.” Mr. Hopkins also emphasized “The Rhazer™ process is consistent with the industry’s future environmental goal of using all ‘Green’ process technologies. The system has a small footprint, low energy consumption and produces no harmful effluents.”

Brian Grenon, President of Grenon Consulting, Inc. is famous for working with mask makers and wafer fabs around the world for over 10 years analyzing the haze phenomenon, trying to develop haze prevention and management solutions. Mr. Grenon was invited by RAVE to assess the new Rhazer™ technology and was quoted as saying, “After nearly a decade of industry yield and revenue losses due to reticle haze, RAVE has developed a unique solution to the reticle haze problem. The solution both abates and removes haze without pellicle removal and damage to the reticle.”

The Rhazer™ system can be used to:

• Preventive Maintenance Cleans – During wafer production, masks that begin to show haze are processed in-fab and then quickly returned to the lithography line.

• Post-Cleans – Masks are processed immediately following lithography line use and just before transfer to the reticle stocker to neutralize haze formation during long term storage.

• Re-Cleans – Masks retrieved from storage for device design re-orders are processed to avoid wet clean, time consuming re-qualification procedures and to ensure no unexpected haze growth during the production.

RAVE is already working with several device manufacturers around the world demonstrating the Rhazer™ process technology. Delivery of the first system is expected in Q3 2009.

About RAVE LLC
RAVE LLC is a global supplier of advanced process solutions to the Semiconductor and Photomask Industries. Since 2001, RAVE has been recognized as the industry leader in advanced photomask repair with products that include high-speed laser and precision nanomachining systems designed for the accurate removal of defects on >=32nm photomasks. With the introduction of the new Rhazer™ Haze Removal System, RAVE is once again pioneering another breakthrough in advanced equipment technology that is expected to bring enormous cost savings to Semiconductor wafer fabs around the world.

RAVE LLC is headquartered in Delray Beach, Florida and maintains sales and service offices in Asia, Europe and the USA. All product and service names are trademarks or registered trademarks.

This press release contains forward-looking statements that involve a number of known and unknown risks, uncertainties and other factors that could cause the actual results, performance or achievements of Company to be materially different from any future results, performance or achievement expressed or implied by such forward-looking statements. Readers are cautioned not to place undue reliance on these forward-looking statements, which speak only as of the date the statement was made. The Company undertakes no obligation to update the forward-looking statements contained herein to reflect events or circumstances after the date hereof or to reflect the occurrence of unanticipated events.