June 27-28, 2017 at the Hilton Hotel, Dresden, Germany. Call 561-330-0411 or e-mail email@example.com to request a customized private product presentation at or near the conference.
July 11-13, 2017 at the Moscone Center, San Francisco, California, USA. Call 561-330-0411 or e-mail firstname.lastname@example.org to request a customized private product presentation at or near the trade exhibition.
Delray Beach, Florida, August 13, 2015 RAVE LLC recently announced receipt of a multi-system purchase order for its Rhazer haze removal systems from one of the world’s leading independent semiconductor memory device manufacturers, extending their commitment to the Rhazer technology. … Read more
RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more
At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more
The BitClean option for RAVE’s Merlin nanomachining tool can safely, completely, and cleanly remove persistent particles and unknown contaminants. See the Complete Applications Note: “BitClean Option for Merlin”
New wafer fab clean tool selected by major independent device manufacturer Delray Beach, Florida, February 13, 2012 – Today, RAVE LLC announced receipt of a multi-system purchase order for its Rhazer® haze removal systems from one of the world’s leading … Read more
Today RAVE N.P., Inc. announced completion of it’s acquisition of the assets and business of Eco-Snow Systems, a member of the Linde Group… Read more
Today RAVE LLC announced the first international shipment of their advanced fp650™ Femtopulse Laser Photomask Repair System to the captive… Read more
Today RAVE LLC announced the Final Acceptance of their newest AFM-based 22nm technology node Merlin® Photomask Repair System… Read more