SPIE Photomask Technology 37th Annual Symposium & Extreme Ultraviolet Lithography (BACUS 2017)

September 11-14, 2017 at the Marriott Hotel & Convention Center, Monterey, California USA.  Please visit our booth at the supplier exhibition.  Also call +1-561-330-0411 or e-mail ravesales@ravenano.com to request a customized private product presentation at or near the symposium.

Posted in Events, News & Events |

Multiple RAVE Rhazer® Tools Purchased by a Major Memory Device Manufacturer

Delray Beach, Florida, August 13, 2015 RAVE LLC recently announced receipt of a multi-system purchase order for its Rhazer haze removal systems from one of the world’s leading independent semiconductor memory device manufacturers, extending their commitment to the Rhazer technology. … Read more

Posted in News & Events, Press Releases |

APPLICATIONS NOTE: EUV Applications for Merlin® and EL-C®

RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more

Posted in Application Notes, Events, News & Events |

IBM/RAVE – Best Oral Presentation Award 2012

At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more

Posted in Awards |

APPLICATIONS NOTE: BitClean Option for Merlin

The BitClean option for RAVE’s Merlin nanomachining tool can safely, completely, and cleanly remove persistent particles and unknown contaminants. See the Complete Applications Note: “BitClean Option for Merlin”

Posted in Application Notes |

RAVE Receives Multi-System Purchase Order for Rhazer®

New wafer fab clean tool selected by major independent device manufacturer Delray Beach, Florida, February 13, 2012    –    Today, RAVE LLC announced receipt of a multi-system purchase order for its Rhazer® haze removal systems from one of the world’s leading … Read more

Posted in News & Events, Press Releases |

RAVE N.P., Inc. Acquires ECO-SNOW Systems

Today RAVE N.P., Inc. announced completion of it’s acquisition of the assets and business of Eco-Snow Systems, a member of the Linde Group… Read more

Posted in News & Events, Press Releases |

First International Shipment of fp650 Femtopulse Laser Mask Repair Tool

Today RAVE LLC announced the first international shipment of their advanced fp650™ Femtopulse Laser Photomask Repair System to the captive… Read more

Posted in News & Events, Press Releases |

RAVE Announces Final Acceptance of 22nm Mask Repair Tool

Today RAVE LLC announced the Final Acceptance of their newest AFM-based 22nm technology node Merlin® Photomask Repair System… Read more

Posted in News & Events, Press Releases |

Barry Hopkins – Lifetime Achievement Award

In 2009, Barry Hopkins, CEO of RAVE LLC was honored by the worldwide Photomask Industry with the SPIE/BACUS Lifetime Achievement Award. Barry was recognized for his 46 years of dedication to photomask business development and advanced mask making equipment technology.

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Posted in Awards |