Category Archives: Press Releases

Multiple RAVE Rhazer® Tools Purchased by a Major Memory Device Manufacturer

Delray Beach, Florida, August 13, 2015 RAVE LLC recently announced receipt of a multi-system purchase order for its Rhazer haze removal systems from one of the world’s leading independent semiconductor memory device manufacturers, extending their commitment to the Rhazer technology. … Read more

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RAVE Receives Multi-System Purchase Order for Rhazer®

New wafer fab clean tool selected by major independent device manufacturer Delray Beach, Florida, February 13, 2012    –    Today, RAVE LLC announced receipt of a multi-system purchase order for its Rhazer® haze removal systems from one of the world’s leading … Read more

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RAVE N.P., Inc. Acquires ECO-SNOW Systems

Today RAVE N.P., Inc. announced completion of it’s acquisition of the assets and business of Eco-Snow Systems, a member of the Linde Group… Read more

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First International Shipment of fp650 Femtopulse Laser Mask Repair Tool

Today RAVE LLC announced the first international shipment of their advanced fp650™ Femtopulse Laser Photomask Repair System to the captive… Read more

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RAVE Announces Final Acceptance of 22nm Mask Repair Tool

Today RAVE LLC announced the Final Acceptance of their newest AFM-based 22nm technology node Merlin® Photomask Repair System… Read more

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RAVE LLC introduces the Rhazer® Haze Removal System

Global semiconductor wafer fabs are struggling with an increasingly serious and costly lithography problem. Wafer stepper exposures initiate the growth of crystalline defect contamination on reticles commonly known as “Haze.” The haze formation rate reduces the number of wafer exposures and forces lithography line stoppage. Read more

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