Category Archives: Events

SPIE Photomask Technology 37th Annual Symposium & Extreme Ultraviolet Lithography (BACUS 2017)

September 11-14, 2017 at the Marriott Hotel & Convention Center, Monterey, California USA.  Please visit our booth at the supplier exhibition.  Also call +1-561-330-0411 or e-mail ravesales@ravenano.com to request a customized private product presentation at or near the symposium.

Posted in Events, News & Events |

APPLICATIONS NOTE: EUV Applications for Merlin® and EL-C®

RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more

Posted in Application Notes, Events, News & Events |