Category Archives: News & Events
November 14-17, 2017 at the Messe München, Munich, Germany. Call 561-330-0411 or e-mail email@example.com to request a customized private product presentation at or near the trade exhibition.
December 13-15, 2017 at the Tokyo Big Site, Tokyo, Japan. Visit us at the Canon booth at the supplier exhibition. Also call 561-330-0411 or e-mail firstname.lastname@example.org to request a customized private product presentation at or near the trade exhibition.
Delray Beach, Florida, August 13, 2015 RAVE LLC recently announced receipt of a multi-system purchase order for its Rhazer haze removal systems from one of the world’s leading independent semiconductor memory device manufacturers, extending their commitment to the Rhazer technology. … Read more
RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more
New wafer fab clean tool selected by major independent device manufacturer Delray Beach, Florida, February 13, 2012 – Today, RAVE LLC announced receipt of a multi-system purchase order for its Rhazer® haze removal systems from one of the world’s leading … Read more
Today RAVE N.P., Inc. announced completion of it’s acquisition of the assets and business of Eco-Snow Systems, a member of the Linde Group… Read more
Today RAVE LLC announced the first international shipment of their advanced fp650™ Femtopulse Laser Photomask Repair System to the captive… Read more
Today RAVE LLC announced the Final Acceptance of their newest AFM-based 22nm technology node Merlin® Photomask Repair System… Read more
Global semiconductor wafer fabs are struggling with an increasingly serious and costly lithography problem. Wafer stepper exposures initiate the growth of crystalline defect contamination on reticles commonly known as “Haze.” The haze formation rate reduces the number of wafer exposures and forces lithography line stoppage. Read more
At the 10th Annual PMJ/BACUS/SPIE Symposium on Photomask & Next Generation Lithography Mask Technology (PMJ 2003) in Kanagawa, Japan, Y. Morikawa, H. Kokubo, M. Nishiguchi and N. Hayashi of Dai Nippon Printing Company, Ltd. (Japan) along with Roy White, Director … Read more