Category Archives: Application Notes

APPLICATIONS NOTE: EUV Applications for Merlin® and EL-C®

RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more

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APPLICATIONS NOTE: BitClean Option for Merlin

The BitClean option for RAVE’s Merlin nanomachining tool can safely, completely, and cleanly remove persistent particles and unknown contaminants. See the Complete Applications Note: “BitClean Option for Merlin”

Posted in Application Notes |