Expanding the Horizons of Semiconductor & Nanotechnology

RAVE LLC is a technology driven company with a long history of revolutionary contributions to the Semiconductor, Photomask and Nanotechnology industries. RAVE is a global supplier of advanced equipment for leading edge Semiconductor and Nanotechnology applications. RAVE’s exceptionally talented team is famous for the development and on-time delivery of innovative process solutions to customers around the world.

Advanced Photomask Finishing & Cleaning

RAVE’s primary product lines specialize in the finishing and cleaning of advanced Photomasks. In the Semiconductor Industry, Photomasks are the primary photolithography medium used in the mass production of modern integrated circuits. Photomasks are master pattern stencils and must be perfect in every respect. With increasing device complexity and decreasing feature sizes, the control of defects on nanoscale circuit patterns has become a serious challenge in the manufacture and management of high-end Photomasks.

In 2001, RAVE introduced equipment technology with unique AFM Guided Nanomachining defect repair capability for Binary Chrome masks, Molybdenum Silicide Attenuated Phase Shift masks, Quartz Alternating Phase Shift masks, carbon patch trimming, sequential defect and foreign contamination removal. Since then, RAVE nanomachining has become the preferred production technique for precision repair of advanced, critical level Photomasks.

In 2008, RAVE introduced the Rhazer™ Haze Removal System designed to clean crystal growth contamination from advanced Photomasks in the wafer fab environment. The introduction of the Rhazer™ system is expected to be another RAVE breakthrough in advanced equipment technology providing enormous cost savings to Semiconductor wafer fabs around the world.

Introducing the new Rhazer™ Haze Removal System

RAVE is currently engaged with numerous Semiconductor device manufacturers demonstrating the haze removal capability of the new Rhazer™ system technology. Production system deliveries are expected to begin in Q1-2009.

Now delivering the new nm450 and fp650 Mask Repair Systems

RAVE’s installed base now includes every major captive and merchant mask shop around the world. Over the last seven years, RAVE has delivered four successive generations of nanomachining mask repair tools. In Q4 2006, RAVE delivered the first nm450 nanomachine mask repair system. RAVE is now shipping additional systems with a second nm450 recently accepted and delivered to a large merchant Photomask supplier. The nm450 reliability and performance specifications make it capable of production level 45nm Technology Node mask repairs and more than suitable for 32nm Technology Node mask development. RAVE has also recently introduced its new fp650 femto-pulse laser high-speed mask repair system for 65nm volume mask production. The successful delivery and acceptance of these next generation systems has once again set RAVE apart as the global production standard for advanced Photomask repair.