news
  • SPIE Advanced Lithography 2017

    February 26-March 2, 2017 at the San Jose Convention Center & San Jose Marriott Hotel, San Jose, California, USA.  Call 561-330-0411 or e-mail ravesales@ravenano.com to request a customized private product presentation at or near the symposium.

  • SEMICON China 2017

    March 7-9, 2017 at the Shanghai New International Exhibition Centre (SNIEC), Shanghai, China.  Visit us at the Scientech booth at the supplier exhibition.  Also call +1-561-330-0411 or e-mail ravesales@ravenano.com to request a customized private product presentation at or near near the trade exhibition.

  • Photomask & NGL Mask Technology XXIV (Photomask Japan 2017)

    April 5-7, 2017 at the Pacifico Yokohama (Annex Hall) Yokohama-City, Kanagawa, Japan.  Visit us at the Canon booth at the supplier exhibition.  Also call 561-330-0411 or e-mail ravesales@ravenano.com to request a customized private product presentation at or near the symposium.

  • Awards

    IBM/RAVE – Best Oral Presentation Award 2012

    At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more

    Barry Hopkins – Lifetime Achievement Award

    In 2009, Barry Hopkins, CEO of RAVE LLC was honored by the worldwide Photomask Industry with the SPIE/BACUS Lifetime Achievement Award. Barry was recognized for his 46 years of dedication to photomask business development and advanced mask making equipment technology.

    Read more