Expanding the Horizons of Nanotechnology

RAVE LLC Nanomachining is a technology driven company specifically focused on providing state-of-the-art equipment for leading edge nanotechnology applications. RAVE’s exceptionally talented team is famous for the development and on-time delivery of innovative nanoscale material shaping process solutions to customers around the world.

Advanced Photomask Finishing

RAVE’s primary product lines are currently designed to specialize in the finishing process of advanced Photomasks. In the Semiconductor Industry, Photomasks are the primary photolithography medium used in the mass production of modern integrated circuit devices. Because they act as master pattern stencils, Photomasks must be perfect in every respect. With increasing pattern complexity and ever decreasing feature sizes, the control of defects on nanoscale circuit patterns has become a serious challenge in the manufacture of high-end Photomasks. In 2001, RAVE introduced equipment technology with unique AFM Guided Nanomachining defect repair capability for Binary Chrome masks, Molybdenum Silicide Attenuated Phase Shift masks, Quartz Alternating Phase Shift masks, carbon patch trimming, sequential defect and foreign contamination removal. Today, RAVE nanomachining is the preferred production technique for precision repair of advanced, critical level Photomasks.

Now delivering the new nm450 and fp650 Mask Repair Systems

RAVE’s installed base now includes every major captive and merchant mask shop around the world. Over the last seven years, RAVE has delivered four successive generations of nanomachining mask repair tools. In Q4 2006, RAVE delivered the first nm450 nanomachine mask repair system. RAVE is now shipping additional systems with a second nm450 recently accepted and delivered to a large merchant Photomask supplier. The nm450 reliability and performance specifications make it capable of production level 45nm Technology Node mask repairs and more than suitable for 32nm Technology Node mask development. RAVE has also recently introduced its new fp650 femto-pulse laser high-speed mask repair system for 65nm volume mask production. The successful delivery and acceptance of these next generation systems has once again set RAVE apart as the global production standard for advanced Photomask repair.