• SEMICON Japan 2015

    December 16-18, 2015 at the Tokyo Big Site, Tokyo, Japan.  Visit us at the Canon booth at the supplier exhibition.  Also call 561-330-0411 or e-mail to request a customized private product presentation at or near the trade exhibition.

  • Multiple RAVE Rhazer® Tools Purchased by a Major Memory Device Manufacturer

    Delray Beach, Florida, August 13, 2015 RAVE LLC recently announced receipt of a multi-system purchase order for its Rhazer haze removal systems from one of the world’s leading independent semiconductor memory device manufacturers, extending their commitment to the Rhazer technology. … Read more

  • APPLICATIONS NOTE: EUV Applications for Merlin® and EL-C®

    RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more

  • Awards

    IBM/RAVE – Best Oral Presentation Award 2012

    At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more

    Barry Hopkins – Lifetime Achievement Award

    In 2009, Barry Hopkins, CEO of RAVE LLC was honored by the worldwide Photomask Industry with the SPIE/BACUS Lifetime Achievement Award. Barry was recognized for his 46 years of dedication to photomask business development and advanced mask making equipment technology.

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